Compact CVD Tube Furnace with 2"OD Quartz tube furnace and 3 gas mixer O1200-50IS-3Z10V

SKU: MND-134458
Model: O1200-50IS-3Z10V

This O1200-50IS-3Z10V compact cvd tube furnace is combined with a mini tube furnace, a 3 gas way mixer station and one two stage rotary vacuum pump. It is desiged for laboratory thin film preparation and small sample high temperature annealing

 Product Description

The O1200-50IS-3Z10V, a Compact CVD Tube Furnace, showcases advanced features for precise and controlled operations. This furnace, with its 2" OD Quartz tube and a 3-gas mixer, is designed to provide efficient functionality. The LED digital gauge ensures clear and accurate temperature display, offering a maximum limiting temperature of 1200℃ while maintaining a working temperature below 1100℃. Temperature control is a standout feature, with an impressive accuracy of ±1℃ and a flexible heating rate ranging from 0 to 20℃/min.

 

The heating mechanism, driven by an Fe-Cr-Al alloy heating element with molybdenum reinforcement, ensures reliability. Temperature measurement is facilitated by a K-type thermocouple. To manage cooling effectively, the furnace adopts a double-layer structure with fan cooling. Alumina fiber constructs the chamber, contributing to its durability. The vacuum system, comprising a mechanical rotary vacuum pump and a turbo pump combined with a rotary vacuum pump, achieves a vacuum range of 10-2 Torr to 10-5 Torr.

 

The cooling process involves air cooling, and the connection pipe, featuring stainless steel bellows and a manual flap valve, enhances control. The gas mixer, equipped with three-way control, accommodates varying flow rates: MFC1 (0 to 100 SCCM), MFC2 (0 to 200 SCCM), and MFC3 (0~500 SCCM). Operating on AC220V at 50Hz, the furnace can withstand working pressures in the range of -0.1MPa to 0.15MPa. This compact CVD tube furnace stands as a reliable and versatile tool for controlled experimentation and applications requiring precise temperature and gas flow management.

 

 

 

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