5L Plasma cleaner (capacitive coupling)

Plasma cleaner is a new high-tech technology that uses plasma to achieve effects that cannot be achieved by conventional cleaning methods. Plasma is a state of matter, also called the fourth state of matter, and it is not the common three states of solid, liquid and gas. Apply enough energy to the gas to ionize and become a plasma state. The "active" components of plasma include: ions, electrons, atoms, active groups, excited nuclides (metastable states), photons, etc. The plasma cleaner uses the properties of these active components to treat the surface of the sample, so as to achieve the purpose of cleaning, coating, etc. 5L Plasma Cleaner Features: The chamber has a large usable area, uniform glowing, and can clean 6-inch silicon wafers. The 5L Plasma Cleaner is equipped with a range of technical parameters. Its cleaning chamber is constructed from SS304 material and measures 200x160x240mm. The coupling method utilized is capacitive coupling for efficient cleaning operations. The RF power supply is an all-solid-state unit featuring a high-stability and high-reliability power amplifier module and a DC module. This design ensures the power supply's consistent RF power output and reliability, with high-quality electronic components enhancing product dependability. This power supply allows for long-term normal operation, simple and flexible use, high power supply efficiency, and minimal heat generation, complemented by a perfect reflection power protection function. The RF power output is continuously adjustable within the 0~300W range, operating at a signal frequency of 13.56MHz ±0.005%. It maintains reflected power levels below or equal to 100W and achieves a remarkable power stability of ±0.1%. The RF connector employed is an N type connector, while the machine efficiency is ≥75%, and harmonic components are kept at ≤-50 dBc through forced air cooling. Gas measurement is facilitated by a two-channel mass flow meter capable of measuring Ar from 0 to 200sccm and O2 from 0 to 200sccm, with customization options available. Vacuum measurement relies on a digital vacuum gauge (resistance gauge), and vacuum extraction is handled by a two-stage rotary vane vacuum pump with motor speeds of 1440 at 50Hz and 1720 at 60Hz, delivering pumping rates of 240L/Min at 50Hz and 288L/Min at 60Hz. The vacuum range spans from 0.1Pa to 10,000Pa, with an ultimate vacuum level of 0.5Pa, ensuring efficient cleaning operations with minimal noise, maintaining motor noise levels below or equal to 56dB. The machine features KF16 connectors for gas inlet and exhaust port and utilizes KF16 vacuum bellows for connecting pipes. Additionally, it incorporates a KF16 ball valve for vacuum control. The motor is rated at 400W, and the power supply operates at AC220V 50/60Hz, drawing a total power of 800W. The cleaner's operational temperature range extends from -10℃ to 40℃, and it maintains a working vacuum of ≤40Pa. The overall dimensions of the unit measure 600mm×650mm×560mm, with a total weight of 80kg, inclusive of packaging, making it a reliable and efficient plasma cleaner for various applications.