300W 2L Plasma cleaning machine P2L-300W

2L plasma cleaner is equipped with a mechanical vacuum pump, while vacuuming maintains the vacuum of the chamber, the pollutants after the plasma reaction can also be pumped away by the vacuum pump; therefore, the short-time cleaning can completely clean the organic pollutants. In addition to the cleaning function, this small plasma cleaner can change the surface properties of some materials according to the needs under certain conditions. During the cleaning process, the glow discharge of the small plasma cleaner not only enhances the adhesion, compatibility and wettability of these materials, but also disinfects and sterilizes the materials. This plasma cleaner is suitable for laboratory and small-scale production. Using 13.56Mhz rf power supply, can be used to match a variety of commonly used gas plasma. There are a variety of common specifications for RF power supply from 100W to 1000W, which can meet the diverse needs of users. The 2L plasma cleaning machine finds a broad spectrum of applications across various industries. In metalworking, it excels at the removal of oil, greasy dirt, organic contaminants, and oxide layers from metal surfaces, ensuring their cleanliness and suitability for subsequent processes. Within the automotive manufacturing sector, it plays a pivotal role in the pre-treatment of plastics, preparing them for paint spraying, a critical step in automotive production. Textile production benefits from the machine's capabilities, allowing for precise adjustments in the hydrophilicity, hydrophobicity, and surface characteristics of textiles, filter screens, and films, thereby enhancing their performance. In the realm of biomedicine, the equipment facilitates the enhancement of Petri dishes' activity and the optimization of properties for vascular stents, syringes, catheters, and the pro-wetting of various materials. These preparations are essential prerequisites for subsequent cross-coating treatments. In the aerospace industry, the plasma cleaning machine is essential for the surface coating pretreatment of insulating materials and electronic components, ensuring their durability and performance in demanding environments. In the electronics sector, it proves indispensable for circuit board cleaning and etching, as well as for non-oxidation and activation treatments of materials like PP, significantly improving their solderability. Within the semiconductor industry, the machine plays a pivotal role in wafer processing and the removal of photoresist, facilitating pre-package pretreatment, a critical step in semiconductor manufacturing. In LED manufacturing, it is instrumental in pre-treating brackets before cleaning and packaging, ensuring the production of high-quality LED components. Additionally, in the plastic and rubber industry, the machine enhances the surface activity of materials such as PS, PE, PTFE, TPE, POM, AS, and PP, making them more amenable to bonding and printing processes, thus expanding its utility across various industrial applications. The 2L plasma cleaning machine boasts an impressive array of technical specifications. Its cleaning chamber is constructed with high-purity quartz, ensuring a pristine and contaminant-free environment for various applications. The chamber's dimensions comprise a diameter of 100mm and a length of 270mm, providing ample space for its intended tasks. The RF power supply is an all-solid-state unit, featuring a high-stability and high-reliability power amplifier module and a DC module. These components collectively ensure consistent RF power output, with a focus on reliability, thanks to the use of high-quality electronic components. The power supply offers several advantages, including extended periods of normal operation, user-friendly and flexible operation, high efficiency, and minimal heat generation. It also incorporates a reflection power protection function. The RF power output is adjustable within a range of 0 to 300W. Signal frequency is precisely maintained at 13.56MHz, with minimal deviation at ±0.005%. Reflected power is limited to ≤100W to ensure stable performance, and power stability is maintained within a tight tolerance of ±0.1%. The RF connector employs a reliable N type connector. Machine efficiency exceeds ≥75%, and harmonic components are minimized to ≤-50 dBc. Cooling is efficiently achieved through forced air cooling. Gas measurement is facilitated by a float flowmeter with two channels. Channel A covers a flow range of 10 to 100ml, while Channel B spans from 16 to 160ml. The vacuum system includes a digital vacuum gauge employing a resistance gauge for precise measurements. A two-stage rotary vane vacuum pump operates at motor speeds of 1440Hz (50Hz) and 1720Hz (60Hz), ensuring efficient pumping rates of 1.1L/s (50Hz) and 1.3L/s (60Hz). The vacuum range extends from 0.1Pa to 10,000Pa, with an ultimate vacuum level of 0.5Pa. Motor noise remains below 56dB. The equipment features gas inlet and exhaust port KF16 interfaces, connected via KF16 vacuum bellows. Vacuum control is achieved through a solenoid valve. The motor power is rated at 400W, and the power supply operates at AC220V 50/60Hz, with a total power consumption of 800W. The operational temperature range spans from -10℃ to 40℃, and the working vacuum is maintained below 40Pa. The overall dimensions of the equipment measure 540mm×650mm×440mm, with a total weight of 58kg, including packaging. These comprehensive technical specifications underscore the robust capabilities of the 2L plasma cleaning machine for a wide range of industrial applications.