300W 10L Plasma cleaner P10L-300W

10L plasma cleaner is equipped with a mechanical vacuum pump, while vacuuming maintains the vacuum of the chamber, the pollutants after the plasma reaction can also be pumped away by the vacuum pump; therefore, the short-time cleaning can completely clean the organic pollutants. In addition to the cleaning function, this small plasma cleaner can change the surface properties of some materials according to the needs under certain conditions. During the cleaning process, the glow discharge of the small plasma cleaner not only enhances the adhesion, compatibility and wettability of these materials, but also disinfects and sterilizes the materials. This plasma cleaner is suitable for laboratory and small-scale production. Using 13.56Mhz rf power supply, can be used to match a variety of commonly used gas plasma. There are a variety of common specifications for RF power supply from 100W to 1000W, which can meet the diverse needs of users. The 300W 10L plasma cleaner finds diverse applications across various industries. In the realm of metalwork, it excels in eliminating oil, greasy residues, organic matter, and oxide layers from metal surfaces. In automotive manufacturing, this equipment plays a crucial role in the pre-treatment of plastics and paint spraying, contributing to the production of high-quality vehicles. Textile production benefits from the plasma cleaner's capabilities by enhancing the hydrophilicity, hydrophobicity, and surface modification of textiles, filter screens, and films. In the field of biomedicine, it is instrumental in improving the activity of Petri dishes, enhancing the properties of vascular stents, syringes, catheters, and promoting pro-wetting of various materials before cross-coating treatment. Aerospace applications involve the surface coating pretreatment of insulating materials and electronic components, ensuring optimal performance and longevity. In the electronics industry, the plasma cleaner is employed for circuit board cleaning and etching, as well as non-oxidation and activation treatment of materials like PP, enhancing their solderability. The semiconductor industry benefits from the equipment for wafer processing and the removal of photoresist, facilitating pre-package pretreatment. In the LED manufacturing sector, it plays a pivotal role in the pre-treatment of brackets before cleaning and packaging. Additionally, in the realm of plastic and rubber, the plasma cleaner improves the surface activity of various materials such as PS, PE, PTFE, TPE, POM, AS, and PP, making them more amenable to bonding and printing processes. This wide array of applications underscores the versatility and utility of the 300W 10L plasma cleaner across multiple industries. The 300W 10L plasma cleaner is equipped with a range of technical parameters and specifications, ensuring efficient and reliable cleaning processes. The cleaning chamber is constructed from high-purity quartz, offering durability and precision. The chamber dimensions measure a diameter of 200mm and a length of 340mm. The RF power supply is a solid-state unit designed for stability and reliability. It incorporates a high-quality power amplifier module and a DC module, guaranteeing consistent RF power output. This power supply boasts several advantages, including long-term normal operation, ease of use, high efficiency with minimal heat generation, and comprehensive reflection power protection functions. The RF power output is continuously adjustable in the range of 0 to 300W. The signal frequency operates at 13.56MHz with exceptional precision (+0.005%), and the reflected power remains under 100W. Power stability is maintained within a tight tolerance of ±0.1%. The RF connector utilizes an N type connector, ensuring a secure and reliable connection. The machine's overall efficiency surpasses 75%, while harmonic components are minimized to ≤-50 dBc. Cooling is achieved through forced air cooling. Gas measurement is facilitated by a float flowmeter, which offers two channels. Channel A covers a flow range of 10 to 100ml, while Channel B ranges from 16 to 160ml. The vacuum system includes a digital vacuum gauge utilizing a resistance gauge for accurate measurements. A two-stage rotary vane vacuum pump with motor speeds of 1440Hz (50Hz) and 1720Hz (60Hz) ensures efficient pumping rates of 1.1L/s (50Hz) and 1.3L/s (60Hz). The vacuum range spans from 0.1Pa to 10,000Pa, with an ultimate vacuum level of 0.5Pa. The motor noise remains below 56dB. The pipe interface features a gas inlet of KF16 and an exhaust port of KF16, connected via KF16 vacuum bellows. A solenoid valve controls the vacuum, and the motor power is rated at 400W. The power supply operates at AC220V 50/60Hz, with a total power consumption of 800W. The operational temperature range is from -10°C to 40°C, and the working vacuum is maintained below 40Pa. The overall dimensions of the equipment are 600mm x 650mm x 560mm, with a total weight of 80kg, including packaging.