300-1HD Single target magnetron sputtering coater
Single target magnetron sputtering coater is equipped with a magnetron sputtering target with a water-cooled interlayer, a 140mm heatable rotating stage, and a DC power supply. The vacuum chamber adopts the top opening method, which makes it easier to change the target. It is an ideal device for making various metal films.
Product Description
The 300-1HD single-target magnetron sputtering coater, an independently developed high-vacuum coating equipment, offers a versatile solution for preparing monolayer or multi-layer films, including ferroelectric, conductive, alloy, and semiconductor films. Equipped with a water-cooled interlayer and a 140mm heatable rotary object stage for the magnetron sputtering target, this coater is designed with convenience in mind, featuring a top-opening vacuum chamber for easy target changes. Ideal for creating various metal films, it stands out as a laboratory equipment essential for materials film preparation.
Designed to thrive under specific installation conditions, the 300-1HD coater demands operational parameters such as altitudes of 1000m or lower, temperatures within the range of 25℃±15℃, and humidity conditions of 55% Rh ± 10% Rh. To ensure optimal performance, the equipment requires a self-circulating chiller for water, AC220V 50Hz electricity with a reliable ground connection, and argon gas with a purity of 99.99% or higher for chamber filling.
This coater, featuring a single target gun and a matching DC power supply for sputter coating conductive materials, brings flexibility to film preparation, making it suitable for diverse applications while maintaining a compact and user-friendly design. The technical specifications reveal its power supply voltage of 220V 50Hz, a rated power of 1200W (excluding the vacuum pump), and a working vacuum degree of 10⁻⁴Pa. The coater operates within a temperature range from room temperature to 500℃ with an accuracy of ±1℃, accommodating target sizes of Ø2’’ with thicknesses ranging from 0.1mm to 5mm. Optional power configurations include DC sputtering power of 500W and RF sputtering power of 300W or 500W.
The loading sample table accommodates Ø140mm samples with adjustable rotation speeds from 1rpm to 20rpm. Inert gases such as Ar and N2 are used for protective gas, controlled by a mass flow meter with 2 channels and a flow rate of 200SCCM. With dimensions of 500mm × 560mm × 660mm for the main unit and 1300mm × 660mm × 1200mm for the entire machine, weighing 160kg, this coater comes with standard accessories, including a DC power control system, film thickness monitor system, molecular pump, chiller, and cooling water pipes (Ø6mm), along with optional accessories like gold, indium, silver, and platinum targets. The after-sales service includes one year of free service, offering remote technical support through telephone guidance, video guidance, mail guidance, and accessory mailing, with on-site service available at the customer's expense.
Disclaimer: The information presented on this website, including product images, product descriptions, and technical parameters, serves as a reference guide. Please note that due to potential delays in updates, discrepancies may exist between the content displayed here and the current product status. We encourage you to reach out to our dedicated sales team to verify the most up-to-date details. It is important to understand that the information provided on this site does not constitute a formal offer or commitment, and our company reserves the right to periodically enhance and amend website information without prior notice. We appreciate your understanding in this regard.