3 Rotary Target Plasma Sputtering Coater with Substrate Heater
3 rotary target plasma sputtering coater is a compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1-3 types of metallic materials to sample with the diameter up to 50 mm.Three sputtering targets: gold, silver, copper are included for immediate use.
Product Description
3 rotary target plasma sputtering coater is a compact plasma thin film sputter (DC common type). The control panel adopts the touch screen mode. The substrate has a limit of 2", the sample is placed with a diameter of Ø50mm and the heating temperature is 500℃.3 rotary target plasma sputtering coater can sputter gold, silver and copper targets, and can not sputter light metals and carbon. This machine uses a rotating sample stage to sequentially coat three layers on the same sample.The film is suitable for the preparation of samples in the laboratory. The Rotary Target Plasma Sputtering Coater with Substrate Heater boasts a set of precise specifications for its operation. It requires a single-phase 220 VAC power supply at 50/60Hz, consuming 700W of power, which includes the vacuum pump. For those using a 110 VAC power source, a transformer will be provided to facilitate compatibility. The output power of this coater is 1600 VDC with a maximum current of 40 mA. The vacuum chamber, constructed from high purity quartz, measures 150 mm in inner diameter, 165 mm in outer diameter, and 150 mm in height. Its sealing flange is composed of stainless steel and features a flat O-ring for effective sealing. The sample stage is equipped with a heater and has a diameter of 50 mm. The sputtering distance can be adjusted within the range of 25 to 40 mm, and the stage is rotatable, offering three sputtering positions that can be controlled through the integrated 6-inch color touch screen. The built-in substrate heater can achieve a maximum temperature of 500°C, with precise temperature control ensured by a PID temperature controller with an accuracy of +/- 1°C, accessible through the touch screen interface. The control panel includes a 6-inch color touch screen with PLC integration for user-friendly operation. It incorporates a vacuum gauge, sputtering current meter, and substrate temperature control, all accessible via the touch screen panel. Adjustment knobs on the front panel allow for gas intake and sputtering current control. Additionally, the touch screen provides access to sputtering position adjustments, a sputtering timer, and process logging. For added safety, a stainless steel shield cage is included in the design. The coater comes with three sputtering targets as part of the standard package, each meeting the dimensions of 47 mm in diameter and varying in thickness: an Au target (47 mm Dia. × 0.12 mm), an Ag target (47 mm Dia. × 0.5 mm), and a Cu target (47 mm Dia. × 2.5 mm). Customizable targets can be ordered separately through . In terms of dimensions, the coater measures 440 mm in length, 330 mm in width, and 455 mm in height, with a net weight of 50 kg. It is backed by a one-year limited warranty, accompanied by lifetime support. However, it's essential to note that this model is not suitable for coating light metallic materials like Al, Mg, Zn, Ni, etc., due to its low energy output. Customers in need of coating these materials are encouraged to explore alternative options such as the magnetron sputtering coater or thermal evaporation coater. A final precautionary note emphasizes the high voltage nature of the sputtering heads, requiring operators to shut down the equipment before performing sample loading or target changing operations to ensure safety.