3 Inch three target magnetron sputtering coater

Introducing the Three-Target Magnetron Sputtering Coater with a Lower Position of Target Gun, designated as model MSP300S-2DC1RF. This cutting-edge coater offers a robust configuration, featuring two DC power supplies at 500W each and one RF power supply at 300W. The vacuum chamber, measuring 450mm in diameter and 450mm in height, incorporates a stainless steel observation window (100mm in diameter) for real-time monitoring. The coater is equipped with three 3-inch target magnetron sputtering guns—comprising one strong magnetic target and two permanent magnet targets—all featuring water-cooled interlayers for efficient cooling.

The sample table, with a diameter of 150mm, is rotatable with an adjustable speed range of 1-20rpm, capable of reaching a maximum heating temperature of 750℃ with a temperature control accuracy of +/- 1.0 °C. Gas flow is precisely controlled by a mass flow meter in the range of 0-200sccm (argon), managed through a user-friendly 15.6-inch screen intelligent control system. The coater utilizes a molecular pump system with one-click operation at 600L/s for vacuum, complemented by an EF Kompirani vacuum gauge (MPG400) with a measurement range spanning from 5 x 10-9 mbar to atmospheric pressure.

Real-time film thickness monitoring is facilitated by the mounted quartz vibration film thickness gauge, boasting a remarkable resolution of 0.1A. Operating on 220V and 50Hz, the coater includes essential components such as sputtering targets, a vacuum chamber, a molecular pump group, film thickness gauge, power supplies, water chilling unit, rotary heating sample table, intelligent control system, air compressor, and various electrically controlled valves and gate valves. This comprehensive setup ensures precise and efficient thin-film deposition processes, making the Three-Target Magnetron Sputtering Coater an ideal choice for laboratory material film preparation.



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