3 Heads Compact 1” RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Option
VTC-3RF is a three head 1" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.
Product Description
Introducing the VTC-3RF, our advanced sputtering coater system designed for precision applications in academic and laboratory settings. This desktop unit, constructed with durable steel, is fully customizable and holds CE and TUV certifications, ensuring top-notch quality.
Operating seamlessly on a single-phase 220 VAC power supply with a frequency of 50/60 Hz, the VTC-3RF draws a total power of 1000 W, encompassing the vacuum pump and water chiller. Its power source comprises a 13.5 MHz, 100 W RF generator with manual matching, offering a load range of 0 - 80 adjustable and a tuning range of -200j to 200j adjustable. The system features a unique rotatable switch that enables the activation of one sputtering head at a time, facilitating smooth transitions "in the plasma" during a multilayer process without breaking vacuum and plasma.
The VTC-3RF is adaptable, allowing modification into 1" DC sputtering sources for metallic film deposition with a DC power supply, accommodating various sputtering head configurations. The system includes three 1" magnetron sputtering heads with water cooling jackets, digitally controlled recirculating water chiller, and optional 300 W auto-match RF generator. Each sputtering head incorporates a manually operated shutter and offers adjustable sputtering distance and angles. The vacuum chamber, constructed from high purity quartz, achieves a maximum vacuum level of 1.0E-5 Torr with an optional turbo pump and chamber baking.
The sample holder, a rotatable and heatable stage made of a ceramic heater with a stainless steel cover, accommodates samples up to 50 mm Dia. for 2" wafers max. With adjustable rotation speed and temperature, the coater ensures uniform coating. The overall dimensions of the system are 540 mm L x 540 mm W x 1000 mm H, with a net weight of 60 kg. CE-approved and backed by a one-year limited warranty with lifetime support, the VTC-3RF is your reliable partner for precise sputtering applications.
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