1200℃ two-zone Rotary PECVD tube furnace with three-channel MFC
This product is a plasma-enhanced rotary chemical vapor deposition system (rotating PECVD). The furnace tube adopts a variable-diameter design. The middle tube diameter is relatively thick and there are mixing partitions, which can repeatedly mix powder or particles with the rotation of the furnace tube.
Product Description
The Rotary PECVD tube furnace, model O1200-60IIC-R, is a sophisticated piece of equipment designed for versatile material processing using a Chemical Vapor Deposition (CVD) method in a controlled atmosphere. Its innovative design incorporates a 360° uninterrupted rotation capability for the working tube through mechanical transmission control. This unique feature allows for thorough stirring and mixing of materials within the tube, ensuring a uniform heating effect. Additionally, the furnace is equipped with a plasma generator that, through inductive coupling, effectively covers the furnace tube with generated plasma. This not only enhances the activation energy of reactants but also reduces reaction temperatures, improving overall reaction efficiency.
The furnace's power capacity stands at 3KW, and its furnace tube is crafted from high-purity quartz, adopting a distinctive heteromorphic tube structure with dimensions of Φ60420+Φ100360+Φ60*420mm. The furnace chamber, measuring 440mm in length, is divided into two 200mm-long heating zones, allowing precise temperature control. Operating within a temperature range of 0 to 1150°C, the furnace can reach a maximum temperature of 1200°C, maintaining an impressive temperature control accuracy of ±1°C. The temperature control system utilizes a K-type thermocouple and employs a 30-segment program temperature control with PID parameter self-tuning. User interaction is facilitated through a high-definition full-color LCD touch screen.
The equipment features a sealed system with a 304 stainless steel vacuum flange, ensuring airtight conditions. Powered by AC 220V at 50/60Hz, it offers variable rotation speed (0 to 13rpm) and tilting capability (0 to 35 degrees), providing flexibility in material processing. The gas supply system integrates a 3-channel mass flow meter (product model 3Z), enabling precise control in three channels with different measuring ranges. The power supply for the system is AC220V at 50/60Hz. The vacuum system, with a dual-stage rotary vane pump, achieves a pumping speed of 1.1L/s and an ultimate vacuum of 10E-1Pa. The power supply for the vacuum system is AC220V at 50/60Hz. The RF power supply, operating at 13.56MHz, offers a power output range of 0~500W, ensuring consistent and reliable RF performance for the furnace.
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