1200℃ two heating zone low vacuum CVD system with 3-channel mass flow meter O1200-50IIT-3Z-LV
1200℃ two zone low vacuum CVD system is equipped with three-channel mass flowmeter, which has high precision and high reliability. It can accurately mix 1~3 channels of gas. The operation panel adopts digital display, which is intuitive and efficient. If you have special needs, you can contact the technician to customize any number of gas channels.
Product Description
The 1200℃ two-zone low vacuum chemical vapor deposition (CVD) system, featuring a 3-channel mass flow meter, is a sophisticated apparatus designed for diverse applications in universities, research institutes, and industrial enterprises. Under the model O1200-50IIT, this system incorporates a vacuum tube furnace with a high-purity quartz tube, providing flexibility in diameter options (50mm, 60mm, 80mm, and 100mm) and a length of 1000mm. The furnace chamber, extending 440mm, boasts two independently temperature-controlled heating zones, each spanning 200mm. Precision temperature control within the range of 0 to 1100℃ is achieved through a 30 or 50 segment program, displayed on an accessible LCD interface.
Sealing integrity is ensured by a 304 stainless steel vacuum flange, featuring versatile flange interfaces in the form of 1/4" ferrule connectors and KF16/25/40 joints. Operating under a vacuum of 4.4E-3Pa, the system is powered by AC:220V 50/60Hz. The gas supply system, designated as model 3Z, introduces a 3-channel gas channel equipped with a gas mass flow meter. Channel A handles 0-100SCCM H2 gas, Channel B manages 0-300SCCM N2 gas, and Channel C accommodates 0-500SCCM Ar gas, ensuring precise gas flow control with a measurement accuracy of ±1.0% F.S. Components of the gas channel, including the needle valve, are constructed from durable 304 stainless steel and feature a 1/4" ferrule connector for gas inlet and outlet. The system exhibits robust pipe pressure resistance of 3MPa, with a working pressure difference ranging from 50 to 300KPa.
The exhaust system is a reliable combination of a mechanical pump and a rotary vane pump, achieving a pumping rate of 1.1L/S. The exhaust interface is thoughtfully designed with a KF16 connection, ensuring efficient gas evacuation. Vacuum measurement is facilitated by a resistance gauge, boasting an ultimate vacuum capability of 1.0E-1Pa. The power supply for the exhaust system mirrors that of the main system, operating at AC:220V 50/60Hz, with the pumping interface also equipped with a KF16 connection. This comprehensive system, with its advanced features and user-friendly interface, is tailored for applications such as high-temperature sintering, metal annealing, quality inspection, and CVD experiments requiring precise gas mixing atmospheres.
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