1200℃ two heating zone low vacuum CVD system with 3-channel float flow meter to supply gas O1200-50IIT-3F-LV
1200℃ two heating zone low vacuum CVD system is equipped with a three-channel float flowmeter, which can accurately prepare the mixed gas required for the experiment. Another pressure gauge is installed on the front of the float flowmeter to monitor the gas pressure and the mixing tank pressure.
Product Description
The 1200℃ two-heating-zone low vacuum chemical vapor deposition (CVD) system, known as Model O1200-50IIT, is a comprehensive solution for various high-temperature applications. Comprising a two-heating zone tube furnace, a three-channel float flow meter, and a double-stage rotary vane vacuum pump, this system offers precise temperature control and versatile programming capabilities.
The tube furnace's two heating zones are independently temperature-controlled, allowing the creation of temperature gradients or constant temperature zones. The furnace tube features digital and mechanical gauges for vacuum control, and the entire system is operated through a high-definition true color touch screen for user-friendly interactions. The instrument is designed for ease of use, enabling efficient experimentation even for non-professionals with minimal training.
Specifically tailored for applications in universities, research institutes, and industrial settings, the system is ideal for high-temperature sintering, metal annealing, and quality inspection. Its capabilities extend to CVD experiments requiring diverse gas mixing atmospheres.
Model O1200-50IIT is constructed with a high-purity quartz tube (50mm diameter, with optional sizes of 60mm, 80mm, and 100mm) and features a fixed tube length of 1000mm. The furnace chamber spans 440mm, accommodating two heating zones measuring 200mm each. Temperature control ranges from 0 to 1100℃ with an impressive accuracy of ±1℃. The system supports program temperature control with 30 or 50 segments, displayed on an LCD interface.
The gas supply system, designated as Model 3F, incorporates a 3-channel gas channel with float flow meters for precise control. Each channel caters to specific gases (H2, N2, Ar) within defined flow ranges. The exhaust system, consisting of a mechanical pump and rotary vane pump, achieves a pumping rate of 1.1L/S and an ultimate vacuum of 1.0E-1Pa. The system operates in a vacuum environment at 4.4E-3Pa, powered by AC:220V 50/60Hz. With its robust construction and advanced features, this CVD system provides a reliable and efficient solution for a wide range of high-temperature applications.
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