1200℃ two heating zone high vacuum CVD system with 3-channel mass flow meter O1200-50IIT-3Z-HV
1200℃ two heating zone high vacuum CVD system is equipped with three-channel mass flowmeter, which has high precision and high reliability. It can accurately mix 1~3 channels of gas. The operation panel adopts digital display, which is intuitive and efficient. If you have special needs, you can contact the technician to customize any number of gas channels.
Product Description
The 1200℃ two-heating-zone high vacuum chemical vapor deposition (CVD) system, identified as the model O1200-50IIT, represents a cutting-edge apparatus designed for precision applications in academic, research, and industrial settings. The system features a high-purity quartz tube with a diameter of 50mm and a length of 1000mm, ensuring optimal conditions for experimentation. The furnace chamber, extending 440mm in length, is equipped with two independently temperature-controlled heating zones, each spanning 200mm. This configuration allows for the creation of distinct temperature gradients or the establishment of a prolonged constant temperature zone, providing versatile temperature control ranging from 0 to 1100℃ with an impressive accuracy of ±1℃.
Temperature control is facilitated through a 30 or 50 segment program, accessible and customizable via the system's intuitive LCD interface. The 304 stainless steel vacuum flange, featuring a 1/4" ferrule connector and KF16/25/40 joint flange interfaces, ensures a reliable seal, maintaining a vacuum of 4.4E-3Pa. The power supply operates on AC:220V 50/60Hz. The gas supply system, denoted as the 3Z model, incorporates a 3-channel gas configuration with gas mass flow meters. Channel A accommodates a gas range of 0 to 100SCCM for H2 gas, Channel B spans 0 to 300SCCM for N2 gas, and Channel C supports 0 to 500SCCM for Ar gas, ensuring precise gas flow control with a measurement accuracy of ±1.0%F.S. Constructed from durable 304 stainless steel, including the needle valve, the gas channel features a 1/4" ferrule connector for gas inlet and outlet.
The exhaust system is a robust combination of the GZK103-A molecular pump with a pumping rate of 600L/S and a rotary vane pump operating at 1.1L/S. This comprehensive system achieves a vacuum of 1.0E-3Pa in just 30 minutes. The interfaces include KF40 for pumping and KF16 for exhaust. Vacuum measurement is facilitated by a compound vacuum gauge integrating a resistance gauge and an ionization gauge, boasting an ultimate vacuum capability of 1.0E-5Pa. The power supply for the exhaust system is AC:220V 50/60Hz, ensuring reliable and precise operation. The versatile applications of the 1200℃ two-heating-zone high vacuum CVD system span high-temperature sintering, metal annealing, quality inspection, and CVD experiments requiring diverse gas mixing atmospheres. Its user-friendly interface, coupled with advanced technical features, makes it an invaluable tool for enhancing experimental efficiency.
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