1200℃ three heating zone low vacuum CVD system with 3-channel float flow meter to supply gas O1200-50IIIT-3F-LV
1200℃ three heating zone low vacuum CVD system is equipped with a three-channel float flowmeter, which can accurately prepare the mixed gas required for the experiment. Another pressure gauge is installed on the front of the float flowmeter to monitor the gas pressure and the mixing tank pressure.
Product Description
The Model O1200-50IIIT, a 1200℃ three-heating-zone low vacuum chemical vapor deposition (CVD) system, stands out as a sophisticated and versatile solution for high-temperature applications. At its core is a vacuum tube furnace constructed from high purity quartz, providing adaptability with tube diameters ranging from 50mm to optional sizes of 60mm, 80mm, and 100mm, complemented by a tube length of 1300mm. The furnace chamber, spanning 1060mm, is strategically equipped with three independently controlled heating zones, each covering 300mm. Its remarkable temperature control precision, operating within a range of 0 to 1100℃ with an accuracy of ±1℃, offers users the flexibility of choosing between 30 or 50 segment program temperature control modes, accessible through an intuitive LCD interface.
Ensuring a reliable vacuum environment, the system incorporates a robust 304 stainless steel vacuum flange with versatile interface options, including 1/4" ferrule connectors and KF16/25/40 joints. Operating efficiently within a low vacuum environment rated at 4.4E-3Pa, the system is powered by a dependable AC supply of 220V at 50/60Hz. The gas supply system, designated as Model 3F, integrates a 3-channel gas channel equipped with gas float flow meters, ensuring precise control over gas flow rates for H2, N2, and Ar. Components, including connecting pipes and needle valves, are constructed from durable 304 stainless steel, featuring standardized interface specifications of 1/4" ferrule connectors for both gas inlet and outlet.
Efficient exhaust is achieved through a combination of a mechanical pump and a rotary vane pump, with the mechanical pump boasting a commendable pumping rate of 1.1L/S. Exhaust interfaces are conveniently designed with KF16 connections. Vacuum measurement is facilitated by a resistance gauge, allowing the system to attain an ultimate vacuum level of 1.0E-1Pa. The power supply for the exhaust system aligns with the primary system, operating at AC:220V 50/60Hz, with the pumping interface also equipped with a KF16 connection for seamless integration.
The applications of this CVD system are diverse, spanning high-temperature sintering, metal annealing, quality inspection, and particularly excelling in CVD experiments requiring varied gas mixing atmospheres. Its user-friendly design, advanced features, and robust construction make it an indispensable tool in the realms of universities, research institutes, and industrial and mining enterprises, enhancing experiment efficiency and precision.
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