1200℃ three heating zone high vacuum CVD system with 3-channel float flowmeter to supply gas O1200-50IIIT-3F-HV
1200℃ three heating zone high vacuum CVD system is equipped with a three-channel float flowmeter, which can accurately prepare the mixed gas required for the experiment. Another pressure gauge is installed on the front of the float flowmeter to monitor the gas pressure and the mixing tank pressure.
Product Description
The Model O1200-50IIIT, a 1200℃ three-heating-zone high vacuum chemical vapor deposition (CVD) system, sets a new standard in experimental precision and versatility. Centered around a vacuum tube furnace made from high purity quartz, this system incorporates advanced features for optimal temperature control and a stringent experimental environment. With tube diameters ranging from 50mm to optional sizes of 60mm, 80mm, and 100mm, and a tube length of 1300mm, the furnace chamber spans 1060mm and houses three distinct heating zones, each covering 300mm. Its temperature control capabilities within the expansive range of 0 to 1100℃ are particularly noteworthy, boasting an accuracy of ±1℃. Users can choose between two temperature control modes—30 or 50 segment program temperature control—accessible through a user-friendly LCD interface.
Sealing integrity is ensured by a robust 304 stainless steel vacuum flange with versatile flange interfaces, offering 1/4" ferrule connectors and KF16/25/40 joints. Operating efficiently within a vacuum pressure of 4.4E-3Pa, the system is powered by a dependable AC supply of 220V at 50/60Hz. The gas supply system, Model 3F, incorporates a 3-channel gas channel equipped with gas float flow meters, providing precise control over gas flow rates for H2, N2, and Ar. Components, including connecting pipes and needle valves, are constructed from durable 304 stainless steel, featuring 1/4" ferrule connectors for standardized gas inlet and outlet connections.
Efficient exhaust is achieved through a combination of a mechanical pump and a rotary vane pump, with impressive pumping rates of 600L/S and 1.1L/S, respectively. Exhaust interfaces are thoughtfully designed with KF40 for pumping and KF16 for the exhaust. Vacuum measurement is facilitated by a compound vacuum gauge incorporating a resistance gauge and an ionization gauge, achieving an ultimate vacuum capability of 1.0E-5Pa.
The Model O1200-50IIIT is not only a technological marvel but also a practical solution, finding applications in high-temperature sintering, metal annealing, quality inspection, and especially in CVD experiments that demand diverse gas mixing atmospheres. Its user-friendly interface, advanced features, and robust design make it an indispensable tool in the laboratories of universities, research institutes, and industrial and mining enterprises.
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