1200℃ single heating zone high vacuum CVD system with 3-channel float flowmeter to supply gas O1200-50IT-3F-HV
1200℃ single heating zone high vacuum CVD system is equipped with a three-channel float flowmeter, which can mix 1~3 channels of gas to accurately prepare the mixed gas required for the experiment. Another pressure gauge is installed on the front of the float flowmeter to monitor the gas pressure and the mixing tank pressure.
Product Description
The 1200℃ single heating zone high vacuum chemical vapor deposition (CVD) system, represented by the model O1200-50IT, stands as a sophisticated solution for diverse applications in high-temperature environments. The system's core components include a vacuum tube furnace, a three-channel float flow meter, and a high vacuum molecular pump set. Precision temperature control is achieved through PID temperature control, allowing users to edit a 30-segment raising and falling temperature program while incorporating safeguards against overheating and short circuits.
Operational control is streamlined through a high-definition true color touch screen, making the system user-friendly, even for non-professionals after minimal training. The furnace tube is flanked by digital vacuum and mechanical pressure gauges, enabling precise control of the atmospheric conditions within. The three-channel float flow meter facilitates the accurate mixing of 1~3 gas channels, crucial for experimental requirements. A pressure gauge on the float flow meter monitors gas and mixing tank pressures.
The system is fortified with a precision molecular pump set, achieving an impressive vacuum level of 1.0E-3Pa. This ensures a stringent and pure experimental environment surpassing ordinary mechanical pumps. Tailored for applications such as high-temperature sintering, metal annealing, and quality inspection, especially in academic, research, and industrial settings, the system is optimized for CVD experiments requiring diverse gas mixing atmospheres.
Delving into the technical parameters, the vacuum tube furnace, with its high purity quartz construction, provides flexibility with optional diameters of 50mm, 60mm, 80mm, or 100mm. The tube length is 800mm, housing a furnace chamber measuring 440mm. The heating zone spans 400mm, complemented by a constant temperature zone of 200mm. Operating within a temperature range of 0 to 1100℃, the system ensures temperature control accuracy of ±1℃. Users can choose between a 30 or 50 segment program temperature control mode, with all relevant data displayed on an LCD interface.
The robust sealing mechanism utilizes a 304 stainless steel vacuum flange with versatile flange interfaces featuring 1/4" ferrule connectors and KF16/25/40 joints. The vacuum level is maintained at 4.4E-3Pa, with power supplied by a stable AC source of 220V at 50/60Hz. The gas supply system, denoted as Model 3F, comprises a 3-channel gas channel with gas float flow meters covering the A channel (0-100ml/min H2 gas), B channel (16-160ml/min N2 gas), and C channel (25-250ml/min Ar gas), boasting a measurement accuracy of ±2.0%. Gas channel components, constructed from robust 304 stainless steel, feature interface specifications with 1/4" ferrule connectors for gas inlet and outlet.
The exhaust system, a crucial element, combines a molecular pump (600) and a backing pump—a rotary vane pump. The molecular pump achieves a commendable pumping rate of 600L/S, ensuring the system reaches a vacuum level of 1.0E-3Pa within 30 minutes. The rotary vane pump offers a pumping rate of 1.1L/S, with KF40 connections for the pumping interface and KF16 for exhaust. Vacuum measurement integrates a compound vacuum gauge, combining a resistance gauge with an ionization gauge, achieving an ultimate vacuum level of 1.0E-5Pa. The exhaust system's power supply aligns with the main system, operating at AC:220V 50/60Hz.
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