1H,1H,2H,2H-Perfluorodecyltriethoxysilane

Synonym: Triethoxy-1H,1H,2H,2H-perfluorodecylsilane
Molecular Formula: C16H19F17O3Si; C8F17CH2CH2Si(OCH2CH3)3
Molecular Weight: 610.38
CAS Number: 101947-16-4
MDL number: MFCD00042334
Note: Prices are for comparison only. Contact Sales for current pricing.
Purity: 97 %
Packing size: 5 G  
Form: liquid  
114.10 EUR
Purity: 97 %
Packing size: 25 G  
Form: liquid  
396.20 EUR



Safety Information


Hazard Statements

H372
H318
H351
H360D
H362
H302 + H332

Precautionary Statements

P280
P301 + P312
P305 + P351 + P338
P308 + P313
P304 + P340 + P312
P263

Pictograms

 Product Description

1H,1H,2H,2H-PERFLUORODECYLTRIETHOXYSILANE is a fluorinated silane compound commonly used as a surface modifier in various industries. It provides excellent hydrophobic and oleophobic properties to surfaces, making it suitable for coatings, adhesives, and sealants.

 

Application:

1H,1H,2H,2H-PERFLUORODECYLTRIETHOXYSILANE finds application as a surface treatment agent to impart water and oil repellency in materials such as glass, metal, and plastic. It is utilized in the formulation of waterproof coatings, stain-resistant fabrics, and anti-fingerprint coatings.

 

 

 

Articles:

- High efficiency ZnO-based dye-sensitized solar cells with a 1H,1H,2H,2H-perfluorodecyltriethoxysilane chain barrier for cutting on interfacial recombination

Publication Date: Available online 10 November 2017

Yahong Xie, Xiaofeng Zhou, Hongyu Mi, Junhong Ma, Jianya Yang, Jian Cheng

https://doi.org/10.1016/j.apsusc.2017.11.075

 

- Robust and durable transparent superhydrophobic boehmite (γ-AlOOH) film by a simple hydrothermal method

Publication Date: Available online 6 January 2021

Chunyan Zhang, Lan Cheng, Ming Zhang, Zhiqiang Long, Fancheng Meng, Huixing Lin

https://doi.org/10.1016/j.ceramint.2021.01.009

 

- Improvement of the stability of an electric double-layer transistor using a 1H,1H,2H,2H-perfluorodecyltriethoxysilane barrier layer

Publication Date: 4 April 2019

Yang Liu, Mami N Fujii, Shoma Ishida, Yasuaki Ishikawa, Kazumoto Miwa, Shimpei Ono, Juan Paolo Soria Bermundo, Naoyuki Fujita and Yukiharu Uraoka

https://doi.org/10.7567/1347-4065/ab008c